Pre-clean and low resistance nano probe

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Pre-clean and low resistance nano probe

  • Product News
  • ·
  • 2020-09-09
Pre-clean and low resistance nano probe

MESOSCOPE is found from July of 2006 in Taipei, Taiwan

Since 2008, MESOSCOPE started to develop Nano Scale probe tip for SEM & STM system

We announced CR35 model for measuring devices below 28nm technology since 2012.

Till to 2019, What we achieved as following.

  • MESOSCOPE has capability to provide the probe for analysis beyond 5nm technology process.
  • Variety product for meeting different technology process failure analysis from above 180nm to beyond 5nm.

探針陳列圖

 

  • Available to be loaded into different probing systems(ThermoFisher/ Hitachi / Kleindiek / Imina / JOEL) included the latest 4th generation probing system. 
  • Pre-bent is optionable. Easy for user to use it directly.
  • MESOSCOPE’s Probe is able to be used directly without preforming any addition cleaning process.
  • The standard lead time of each models is 3~4 weeks.
  • Compare to other vendor’s probe resistance, MESOSCOPE’s is equal or lower than it.

 

Probe Resistance Value While De-pack

The total resistance is 59.88Ω, included two tips resistance and sample resistance.

Therefore, the single tip resistance is smaller than 30 Ω.

 
 
 
 

Various Model on 14nm Technology Nodes

Pre-Clean Products that could be used directly

High Depth Width Ratio value is easier to land multiple probes on small area